Ironing Brush
发布于:2024-09-04
Main Function:
Customize and modify the shrinkage ratio in designated areas to stretch or contract the fabric, enhance three-dimensional form, and adjust fabric tension.
Purpose:
Simulates the stretching or shrinking of pattern pieces using an iron
Operation Path:
Home ▶Shape Brush ▶ Ironing Brush
Operation Path:
Click on a 2D/3D pattern to generate a steam on the pattern. The bluer the color of the steam displays, the more the mesh shrinks and the smaller the simulated area is; the redder the color of the steam displays, the more the mesh stretches and the larger the simulated area is.
Right-click on a pattern to delete all the steam on the selected panel/delete all the steam. Click the steam while pressing Ctrl to remove steam from existing locations. Click the steam while pressing Shift to create steam with contrary current shrinkage.
Name | range | Function |
---|---|---|
Warp | 【-50,50】(%) | Controls the intensity of the shaping (flattening/stretching) effect along the warp (vertical) direction of the fabric. Increase this value if the fabric is tight or requires more stretching or gathering vertically. |
Weft | 【-50,50】(%) | Controls the intensity of the shaping effect along the weft (horizontal) direction. Increase the weft value to adjust the fabric horizontally, such as tightening the waist or expanding the chest. |
Size | 【0,300】(mm) | Adjusts the brush’s radius of influence. A larger size affects a wider area, suitable for broad adjustments; a smaller size allows for fine-tuning. |
Hardness | 【0,100】(%) | Controls the falloff of brush intensity from the center to the edge. Higher values create a strong center and softer edges for a more natural effect; lower values result in a more uniform application. |
Name | Function | |
---|---|---|
Cross SewLine | When enabled, the brush effect can extend across seam lines and affect adjacent pattern pieces, rather than being limited to the currently selected piece. | |
Support Symmetry | When enabled, operations performed on a symmetric pattern piece will be automatically mirrored to its symmetrical counterpart. |